Total Reflection X-ray Fluorescence Spectrometry for Characterization of Nuclear Materials
نویسندگان
چکیده
Total reflection X-Ray Fluorescence (TXRF) is a comparatively new technique of material characterization and trace element analysis. It is an advanced variant of Energy Dispersive X-ray Fluorescence (EDXRF) and is based on the principle of total reflection of X-rays when these radiations fall on a flat smooth surface at a grazing angle less than the critical angle of the sample support. The critical angle is in the range of about 0.11 degree in most cases. For TXRF analysis, a few microlitres of sample solution is deposited and dried on a flat sample support to make a thin film specimen and irradiated with X-rays in total reflection condition. As the X-rays do not penetrate inside the sample support in this condition, there is very little scattering of the X-rays from the sample support and, therefore, the background is considerably reduced. In addition, the specimen is excited by incoming as well as the totally reflected beam. This condition makes the excitation efficiency of the elements almost double compared to the conventional X-Ray Fluorescence (XRF). Moreover, since the detector can be placed Total Reflection X-ray Fluorescence Spectrometry for Characterization of Nuclear Materials
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